News and Events

2010-01-13

Eco-Snow cleaning technology improves efficiency for U.S. photomask manufacturer

Eco-Snow Systems is helping a major U.S. photomask manufacturer save money and improve the quality of its photomasks and reticles with a cleaning technology designed for the 28nm DRAM half-pitch technology node. The photomask manufacturer has been using the Eco-Snow MaskClean® 150 technology for several months on masks now in production, as well as for development of the 28 nm node scheduled for production by 2014.

2009-01-28

Eco-Snow Systems™ introduces new technology for cleaning image sensors

During the manufacturing process for these sensors, which are used in camera phones, PC cameras and, of course, video and still cameras, microscopic particles can settle on the lens, impacting picture quality. And as pixel size continues to decrease in order to achieve higher image resolution, the size of problematic particles on these lenses also continues to shrink.

2008-07-07

Eco-Snow™ CO2 systems help clean up MEMS sensors

Eco-Snow Systems has developed automated cleaning technology for the Micro Electrical Mechanical Systems industry that helps reduce defect rates and increase device reliability.